Contents51-9

Vol. 51 No. 9 CONTENTS
Special Issue on Semiconductor and Electronics
General Paper

Special Issue on Semiconductor and Electronics (Vol.51 No.9)

Foreword
Y.Hamakawa	965

Review paper (Vol.51 No.9)

Nondestructive Measurement of Strain Distribution in Semiconductor Wafers and Devices by a Scanning Infrared Polariscope

Masayuki FUKUZAWA, Tao CHU and Masayoshi YAMADA
966

Technical Topics (Vol.51 No.9)

Recent Technology and Trend of Mass Storage Flash Memory

Tsuyoshi TOYAMA and Kenji KODA
971

Original Paper (Vol.51 No.9)

Observations of Polarization Switching Processes in Ferroelectric Pb(Zr,Ti)O3 Thin Films Using Piezoresponse Scanning Force Microscopy

Hironori FUJISAWA, Tatsuya YAGI, Masaru SHIMIZU and Hirohiko NIU
975

Optical Waveguide Switches and Hybrid Devices by Silica-Based Material

Kazuyuki MORIWAKI and Yoshinori HIBINO
979

Characterization of GaN and Related Nitrides by Raman Scattering

Hiroshi HARIMA
983

Development of Photoluminescence Microscope with Sub-Micron Resolution at Low Temperature and Its Application to Detection of Defects in Wide-Gap Semiconductors

Masahiro YOSHIMOTO
989

Characterization of Semiconductor Materials at Sub-Micron Scale Using Scanning Capacitance Microscopy

Takayuki UCHIHASHI, Yoshimori ISHIZUKA, Haruhiko YOSHIDA and Seigo KSIHINO
995

Development of Extreme Ultra-Violet Lithography System

Hiroo KINOSHITA, Takeo WATANABE, Kazuhiro HAMAMOTO and Harushige TSUBAKINO
999

A Fabrication of an Image Sensor Using SiGe-BiCMOS Technology

Jun OHTA, Naoyuki TOKIDA, Keiichiro KAGAWA Takashi TOKUDA and Masahiro NUNOSHITA
1005

General Paper (Vol.51 No.9)

Original Paper (Vol.51 No.9)

On the Examination of the Strong Discontinuity Analysis for a Kinking Discontinuous Surface

Tamaki SUGIMOTO, Chikayoshi YATOMI and Yoichi SUZUKI
1011

Evaluation of Fretting Fatigue Limit Based on Local Stress at the Contact Edge

Yoshiyuki KONDO, Chu SAKAE, Masanobu KUBOTA, Tomohiro NAGASUE and Shin-ichi SATO
1017

Statistical Characteristics on the Microcrack Growth Behavior of a Squeeze Cast Al Alloy

Masahiro GOTO, Seung-Zeon HAN, Takaei YAMAMOTO, Hironobu NISITANI, Norio KAWAGOISHI and Tomoshi MATSUI
1023

Modeling and Prediction of the Laser Surface Annealing Process of Inconel 718

Liufa LIU, Akio HIROSE and Kojiro F. KOBAYASHI
1030

Suraface Modification and Adhesive Properties of GF/PP Composites by Using Oxygen Plasma Treatment

Takashi MATSUOKA, Kazuhiko SAKAGUCHI and Chihiro HATA
1038

Bead Shape on Directed Plasma Fabrication Process

Chitoshi HAYASHI, Takeshi SHINODA and Yoshihisa KATO
1045

3-D Forming of Intermetallics by Reactive Rapid Prototyping

Janghwan OH, Soshu KIRIHARA, Yoshinari MIYAMOTO, Kiyotaka MATSUURA and Masayuki KUDOH
1051

Lecture (Vol.51 No.9)

Materials Science Toward "Super-" and "Ultra-" High Temperature Technologies 䗚:New Testing Methods for High Temperature Materials and Components

Masao SAKANE and Yomei YOSHIOKA
1057

Nondestructive Measurement of Strain Distribution in Semiconductor Wafers and Devices by a Scanning Infrared Polariscope
Masayuki FUKUZAWA, Tao CHU and Masayoshi YAMADA	966

Recent Technology and Trend of Mass Storage Flash Memory
Tsuyoshi TOYAMA and Kenji KODA	971

Observations of Polarization Switching Processes in Ferroelectric Pb(Zr,Ti)O3 Thin Films Using Piezoresponse Scanning Force Microscopy
Hironori FUJISAWA, Tatsuya YAGI, Masaru SHIMIZU and Hirohiko NIU	975
Optical Waveguide Switches and Hybrid Devices by Silica-Based Material
Kazuyuki MORIWAKI and Yoshinori HIBINO	979
Characterization of GaN and Related Nitrides by Raman Scattering
Hiroshi HARIMA	983
Development of Photoluminescence Microscope with Sub-Micron Resolution at Low Temperature and Its Application to Detection of Defects in Wide-Gap Semiconductors
Masahiro YOSHIMOTO	989
Characterization of Semiconductor Materials at Sub-Micron Scale Using Scanning Capacitance Microscopy
Takayuki UCHIHASHI, Yoshimori ISHIZUKA, Haruhiko YOSHIDA and Seigo KSIHINO	995
Development of Extreme Ultra-Violet Lithography System
Hiroo KINOSHITA, Takeo WATANABE, Kazuhiro HAMAMOTO and Harushige TSUBAKINO	999
A Fabrication of an Image Sensor Using SiGe-BiCMOS Technology
Jun OHTA, Naoyuki TOKIDA, Keiichiro KAGAWA Takashi TOKUDA and Masahiro NUNOSHITA	1005

On the Examination of the Strong Discontinuity Analysis for a Kinking Discontinuous Surface
Tamaki SUGIMOTO, Chikayoshi YATOMI and Yoichi SUZUKI	1011
Evaluation of Fretting Fatigue Limit Based on Local Stress at the Contact Edge
Yoshiyuki KONDO, Chu SAKAE, Masanobu KUBOTA, Tomohiro NAGASUE and Shin-ichi SATO	1017
Statistical Characteristics on the Microcrack Growth Behavior of a Squeeze Cast Al Alloy
Masahiro GOTO, Seung-Zeon HAN, Takaei YAMAMOTO, Hironobu NISITANI, Norio KAWAGOISHI and Tomoshi MATSUI	1023
Modeling and Prediction of the Laser Surface Annealing Process of Inconel 718
Liufa LIU, Akio HIROSE and Kojiro F. KOBAYASHI	1030
Suraface Modification and Adhesive Properties of GF/PP Composites by Using Oxygen Plasma Treatment
Takashi MATSUOKA, Kazuhiko SAKAGUCHI and Chihiro HATA	1038
Bead Shape on Directed Plasma Fabrication Process
Chitoshi HAYASHI, Takeshi SHINODA and Yoshihisa KATO	1045
3-D Forming of Intermetallics by Reactive Rapid Prototyping
Janghwan OH, Soshu KIRIHARA, Yoshinari MIYAMOTO, Kiyotaka MATSUURA and Masayuki KUDOH	1051

Materials Science Toward "Super-" and "Ultra-" High Temperature Technologies 䗚:New Testing Methods for High Temperature Materials and Components
Masao SAKANE and Yomei YOSHIOKA	1057