Low-Temperature Deposition of Silicon Nitride Films by a Cat-CVD Technique -Gas-Phase Diagnoses and Evaluation of Film Properties-

Hironobu UMEMOTO, Atsushi MASUDA, Hideki MATSUMURA, Toshiharu MINAMIKAWA, Akira HEYA, Masahiro TAKANO, Yasuto YONEZAWA, Toshikazu NIKI, Susumu MUROI and Shigehira MINAMI