Technical Topics (Vol.55 No.2)

Low-Temperature Deposition of Silicon Nitride Films by a Cat-CVD Technique -Gas-Phase Diagnoses and Evaluation of Film Properties-
Hironobu UMEMOTO, Atsushi MASUDA, Hideki MATSUMURA, Toshiharu MINAMIKAWA, Akira HEYA, Masahiro TAKANO, Yasuto YONEZAWA, Toshikazu NIKI, Susumu MUROI and Shigehira MINAMI	142

Original Paper (Vol.55 No.2)

Formation of Well Alligned Rod Type Eutectic Structure for Bulk ƒĄ-FeSi2 by Solid Reaction and Its Orientation Analysis@
Isamu YAMAUCHI, Akio MISHINA, Tomohiko AKAHORI and Yasufumi FUJIWARA	148
Fabrication and Properties of ZnO Thin Films Prepared by Micro Channel Mist Mehtod
Toshiyuki KAWAHARAMURA, Hiroyuki NISHINAKA, Keisuke KAMETANI, Yoshio MASUDA, Masataka TANIGAKI and Shizuo FUJITA	153
Molecular Modification of ZnO Surface
Ken-ichi OGATA, Kazuto KOIKE, Yasuyuki HIRATA, Shigehiko SASA, Masataka INOUE and Mitsuaki YANO	159
A Trial of Smell Discrimination by SnO2 Gas Sensor
Akira FUJIMOTO, Takeshi KANASHIMA and Masanori OKUYAMA	165
First-Principles Study of Tetragonality Ratio and Unit-Cell Volume Influence on Spontaneous Polarization of BaTiO3 and PbTiO3
Dan RICHINSCHI, Takeshi KANASHIMA and Masanori OKUYAMA	169
Internal Resonant Mode of Piezo-Composite Fabricated Using X-Ray Lithography
Yoshihiro HIRATA, Toshiyuki NUMAZAWA, Kazuo NAKAMAE and Hiroshi TAKADA	173
Influence of Electron Scattering on Resist Pattern Edge Roughness in Low Dose Electron Beam Lithography
Masatoshi KOTERA	177